Title of article :
Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
Author/Authors :
Tai-Chou Lee، نويسنده , , Pei-Chun Chen، نويسنده , , Ting-Ying Lai، نويسنده , , Wirote Tuntiwechapikul، نويسنده , , Jun-Hyun Kim، نويسنده , , T. Randall Lee، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
5
From page :
7064
To page :
7068
Abstract :
This paper describes an initial evaluation of the use of aliphatic dithiocarboxylic acids (ADTCAs) as transient protecting agents in soft lithographic patterning, also known as microcontact printing (μCP). Surfaces micropatterned using ADTCA-based inks (C10–C16) were compared to that patterned using a standard hexadecanethiol ink. The patterns were characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Etch-removal studies of SAM-coated gold substrates found that the longer chain-length ADTCAs (C13–C16) provide better protection against etching than the shorter chain-length ADTCAs (C10–C12). These studies demonstrate that ADTCA-derived SAMs can be used as effective resists for soft lithographic applications.
Keywords :
Self-assembled monolayers , Dithiocarboxylic acids , Soft lithography
Journal title :
Applied Surface Science
Serial Year :
2008
Journal title :
Applied Surface Science
Record number :
1009654
Link To Document :
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