• Title of article

    Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning

  • Author/Authors

    Tai-Chou Lee، نويسنده , , Pei-Chun Chen، نويسنده , , Ting-Ying Lai، نويسنده , , Wirote Tuntiwechapikul، نويسنده , , Jun-Hyun Kim، نويسنده , , T. Randall Lee، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    5
  • From page
    7064
  • To page
    7068
  • Abstract
    This paper describes an initial evaluation of the use of aliphatic dithiocarboxylic acids (ADTCAs) as transient protecting agents in soft lithographic patterning, also known as microcontact printing (μCP). Surfaces micropatterned using ADTCA-based inks (C10–C16) were compared to that patterned using a standard hexadecanethiol ink. The patterns were characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Etch-removal studies of SAM-coated gold substrates found that the longer chain-length ADTCAs (C13–C16) provide better protection against etching than the shorter chain-length ADTCAs (C10–C12). These studies demonstrate that ADTCA-derived SAMs can be used as effective resists for soft lithographic applications.
  • Keywords
    Self-assembled monolayers , Dithiocarboxylic acids , Soft lithography
  • Journal title
    Applied Surface Science
  • Serial Year
    2008
  • Journal title
    Applied Surface Science
  • Record number

    1009654