Title of article :
Phase transformation in BN films by nitrogen-protected annealing at atmospheric pressure
Author/Authors :
Xiaokang Zhang، نويسنده , , Jinxiang Deng، نويسنده , , Ling Wang، نويسنده , , Xuyang Wang، نويسنده , , Qian Yao، نويسنده , , Guanghua Chen، نويسنده , , Deyan He، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
5
From page :
7109
To page :
7113
Abstract :
Two groups of RF-sputtered BN films (pure hexagonal phase and approximately 27.5% cubic content, respectively) were annealed at 600 to 1000 °C under nitrogen at atmospheric pressure after deposition. FTIR spectroscopy indicates a reversible transformation from hexagonal phase to cubic phase, and again hexagonal phase. The most effective temperature for h-BN converting to cubic zincblende (c-BN) is 900 °C. Further, the indirectly stepwise transformation from hexagonal (h-BN) to explosive BN (E-BN) and then to c-BN employing metastable E-BN as an intermedium was observed. In addition, we tentatively put forward that the existence of defective h-BN and the N defects plays a key role on h-BN to c-BN transformation.
Keywords :
Annealing , FTIR , Boron nitride films , Phase transformation
Journal title :
Applied Surface Science
Serial Year :
2008
Journal title :
Applied Surface Science
Record number :
1009662
Link To Document :
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