Title of article
Pd adsorption on Si(1 1 3) surface: STM and XPS study
Author/Authors
Shinsuke Hara، نويسنده , , Masamichi Yoshimura، نويسنده , , Kazuyuki Ueda، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
6
From page
7797
To page
7802
Abstract
Pd-induced surface structures on Si(1 1 3) have been studied by scanning tunneling microscopy (STM) and X-ray photoelectron spectroscopy (XPS). In the initial process of the Pd adsorption below 0.10 ML, Pd silicide (Pd2Si) clusters are observed to form randomly on the surface. By increasing the Pd coverage to 0.10 ML, the clusters cover the entire surface, and an amorphous layer is formed. After annealing the Si(1 1 3)-Pd surface at 600 °C, various types of islands and chain protrusions appears. The agglomeration, coalescence and crystallization of these islands are observed by using high temperature (HT-) STM. It is also found by XPS that the islands correspond to Pd2Si structure. On the basis of these results, evolution of Pd-induced structures at high temperatures is in detail discussed.
Keywords
Si(1 1 3) , Island , Scanning tunneling microscopy , X-ray photoelectron spectroscopy , Cluster , Pd , Silicide
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009802
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