Title of article :
Investigations of semiconductor devices using SIMS; diffusion, contamination, process control
Author/Authors :
Jae Cheol Lee، نويسنده , , Jeongyeon Won، نويسنده , , Youngsu Chung، نويسنده , , Hyungik Lee، نويسنده , , Eunha Lee، نويسنده , , Donghun Kang، نويسنده , , Changjung Kim، نويسنده , , Jinhak Choi، نويسنده , , Jeomsik Kim، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
5
From page :
1395
To page :
1399
Abstract :
We have surveyed 22,155 analyses issues to know the portion of surface analysis at the total analyses activities. According to the survey result, the contribution of SIMS in the total analyses issues was about 7%. The portions of semiconductor process control, composition and contamination in the SIMS analyses issues are 25%, 29% and 16%, respectively. In this article, some examples of the semiconductor device process control, identification of contaminants, and failure analyses have been reviewed. The behavior of H, O, and Ti at the Pt/Ti/GaInZnO interfaces and their influences on the electrical property of thin film transistor are demonstrated. Also discolor issues including organic material contamination problem on Au pad are discussed in detail.
Keywords :
SIMS , Diffusion , Process control , contamination
Journal title :
Applied Surface Science
Serial Year :
2008
Journal title :
Applied Surface Science
Record number :
1009838
Link To Document :
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