Title of article
Development of a high lateral resolution TOF-SIMS apparatus for single particle analysis
Author/Authors
Tetsuo Sakamoto، نويسنده , , Masaomi Koizumi، نويسنده , , Jyunji Kawasaki، نويسنده , , Jyun Yamaguchi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
4
From page
1617
To page
1620
Abstract
A novel TOF-SIMS apparatus was designed and constructed aiming at single small particle analysis. The apparatus consisted of high lateral resolution TOF-SIMS part and SEM function for seeking analytical target. A pulsed Ga-focused ion beam (FIB) was also newly developed for this purpose based on state-of-the art ion optics. Secondary ion yield of Al was 1.8 × 10−2 which is high enough small area analysis, and mass resolution was also acceptable for element analysis. The most prominent feature, lateral resolution, was demonstrated to be 40 nm in actual mapping of an IC cross-section. As an application aerosol particles were analyzed individually.
Keywords
TOF-SIMS , Lateral resolution , Secondary ion yield , cross-section , Particle
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009905
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