Title of article :
The effect of C60 cluster ion beam bombardment in sputter depth profiling of organic–inorganic hybrid multiple thin films
Author/Authors :
Hyun Kyong Shon، نويسنده , , Tae Geol Lee، نويسنده , , Dahl Hyun Kim، نويسنده , , Hee Jae Kang، نويسنده , , Byoung-Hoon Lee، نويسنده , , Myung Mo Sung، نويسنده , , Dae Won Moon، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Abstract :
The effects of C60 cluster ion beam bombardment in sputter depth profiling of inorganic–organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs+, 10 keV C60+, 20 keV C602+ and 30 keV C603+ was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.
Keywords :
TOF-SIMS , C60 cluster ion bombardment , Inorganic–organic multiple nm thin films
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
