• Title of article

    SIMS analysis of 83Kr implanted UO2

  • Author/Authors

    S. Portier، نويسنده , , S. Brémier، نويسنده , , R. Hasnaoui، نويسنده , , O. Bildstein، نويسنده , , C.T. Walker، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    4
  • From page
    1323
  • To page
    1326
  • Abstract
    A UO2 single crystal implanted with 83Kr was analysed with a shielded Cameca IMS 6f SIMS. The main objective was to develop measurement and quantification procedures for krypton in irradiated nuclear fuel. It was found that good quality 83Kr+ depth profiles could be obtained with a 16O2+ primary ion beam, a positive offset voltage of around 20 V and an oxygen leak. To convert erosion time to depth the craters produced during depth profiling were measured using an interferometer microscope. The measured depth profiles were in good agreement with the Gaussian implantation profiles. The 83Kr+ signal intensity, I, increased with current density, J, in accordance with the relationship I = A′J2 + B′J which indicates that ionisation occurred above the sample surface by inelastic collisions with oxygen atoms.
  • Keywords
    Depth profiling , Quantification , SIMS , Uranium dioxide , Krypton
  • Journal title
    Applied Surface Science
  • Serial Year
    2008
  • Journal title
    Applied Surface Science
  • Record number

    1010496