Title of article
SIMS analysis of 83Kr implanted UO2
Author/Authors
S. Portier، نويسنده , , S. Brémier، نويسنده , , R. Hasnaoui، نويسنده , , O. Bildstein، نويسنده , , C.T. Walker، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
4
From page
1323
To page
1326
Abstract
A UO2 single crystal implanted with 83Kr was analysed with a shielded Cameca IMS 6f SIMS. The main objective was to develop measurement and quantification procedures for krypton in irradiated nuclear fuel. It was found that good quality 83Kr+ depth profiles could be obtained with a 16O2+ primary ion beam, a positive offset voltage of around 20 V and an oxygen leak. To convert erosion time to depth the craters produced during depth profiling were measured using an interferometer microscope. The measured depth profiles were in good agreement with the Gaussian implantation profiles. The 83Kr+ signal intensity, I, increased with current density, J, in accordance with the relationship I = A′J2 + B′J which indicates that ionisation occurred above the sample surface by inelastic collisions with oxygen atoms.
Keywords
Depth profiling , Quantification , SIMS , Uranium dioxide , Krypton
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1010496
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