Title of article :
Antireflective structure imprinted on the surface of optical glass by SiC mold
Author/Authors :
Kazuhiro Yamada، نويسنده , , Makoto Umetani، نويسنده , , Takamasa Tamura، نويسنده , , Yasuhiro Tanaka، نويسنده , , Haruya Kasa، نويسنده , , Junji Nishii، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
4
From page :
4267
To page :
4270
Abstract :
An antireflective structure with two-dimensional 300-nm periodicity was fabricated on a phosphate glass surface using an imprinting process with a SiC mold. The optimized structure designed using RCWA calculation was a convex circular cone sharing the ridge line of adjacent cones. The SiC mold was fabricated using electron beam drawing and subsequent reactive ion etching with CHF3 and O2 gases. The glass’ surface reflectance was estimated as 0.2% at 530 nm wavelength, which was approximately 1/20 that of the optically polished surface.
Keywords :
Antireflective surface , Glass , Subwavelength structure , Optical element , Electron beam lithography , Reactive ion etching
Journal title :
Applied Surface Science
Serial Year :
2009
Journal title :
Applied Surface Science
Record number :
1011081
Link To Document :
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