Title of article
Effects of buffer layer annealing temperature on the structural and optical properties of hydrothermal grown ZnO
Author/Authors
X.Q. Zhao، نويسنده , , C.R. Kim، نويسنده , , J.Y. Lee، نويسنده , , J.H. Heo، نويسنده , , C.M. Shin، نويسنده , , H. Ryu، نويسنده , , J.H. Chang، نويسنده , , H.C. Lee & E.M. Baggs، نويسنده , , C.S. Son، نويسنده , , W.J. Lee، نويسنده , , W.G. Jung، نويسنده , , S.T. Tan، نويسنده , , J.L. Zhao، نويسنده , , X.W. Sun، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
5
From page
4461
To page
4465
Abstract
ZnO was deposited on bare Si(1 0 0), as-deposited, and annealed ZnO/Si(1 0 0) substrates by hydrothermal synthesis. The effects of a ZnO buffer layer and its thermal annealing on the properties of the ZnO deposited by hydrothermal synthesis were studied. The grain size and root mean square (RMS) roughness values of the ZnO buffer layer increased after thermal annealing of the buffer layer. The effect of buffer layer annealing temperature on the structural and optical properties was investigated by photoluminescence, X-ray diffraction, atomic force microscopy, and scanning electron microscopy. Hydrothermal grown ZnO deposited on ZnO/Si(1 0 0) annealed at 750 °C with the concentration of 0.3 M exhibits the best structural and optical properties.
Keywords
ZnO , Hydrothermal synthesis , Buffer layer annealing
Journal title
Applied Surface Science
Serial Year
2009
Journal title
Applied Surface Science
Record number
1011116
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