Title of article :
Dose and pressure dependence of silicon microstructure in SF6 gas due to excimer laser irradiation
Author/Authors :
H.R. Dehghanpour، نويسنده , , P. Parvin، نويسنده , , B. Sajad، نويسنده , , S.S. Nour-Azar، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
6
From page :
4664
To page :
4669
Abstract :
ArF excimer laser radiation on Si surface at controlled SF6 atmosphere creates a microstructure whose alteration at various UV doses and SF6 pressures are investigated in this work. Moreover, a rigorous model has been presented here regarding the experiments based on the micro-fluid mechanical properties of molten silicon layer and the subsequent mechanical wave resonance due to the surface shallow fluid theory. The competitive thermal and non-thermal UV laser interaction with Si and the following heat transfer explains the creation of the self-assembled micro-pillars on Si surface.
Keywords :
Surface wave , Resonance pattern , ArF laser , Si microstructure
Journal title :
Applied Surface Science
Serial Year :
2009
Journal title :
Applied Surface Science
Record number :
1011153
Link To Document :
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