Title of article
Radiofrequency plasma beam deposition of various forms of carbon based thin films and their characterization
Author/Authors
S. Vizireanu، نويسنده , , S.D. Stoica، نويسنده , , B. Mitu، نويسنده , , M.A. Husanu، نويسنده , , A. Galca، نويسنده , , L. Nistor، نويسنده , , G. Dinescu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
4
From page
5378
To page
5381
Abstract
The characteristics of carbonic materials obtained by downstream deposition in a low pressure argon plasma beam injected with acetylene are reported. The influence of substrate temperature, presence of Ni catalyst and hydrogen in gas composition on the material properties is described. By increasing the substrate temperature, an enhanced order in the material is revealed by Raman spectroscopy, while FTIR measurements show a decreasing of the hydrogen content and the disappearing of sp1 hybridized carbon in the deposit. The SEM and Raman investigation show a clear tendency of crystalline phases formation when hydrogen is assisting the deposition.
Keywords
PECVD , Amorphous hydrogenated carbon material , Nanostructured carbon , RF plasma beam
Journal title
Applied Surface Science
Serial Year
2009
Journal title
Applied Surface Science
Record number
1011293
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