• Title of article

    Radiofrequency plasma beam deposition of various forms of carbon based thin films and their characterization

  • Author/Authors

    S. Vizireanu، نويسنده , , S.D. Stoica، نويسنده , , B. Mitu، نويسنده , , M.A. Husanu، نويسنده , , A. Galca، نويسنده , , L. Nistor، نويسنده , , G. Dinescu، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    4
  • From page
    5378
  • To page
    5381
  • Abstract
    The characteristics of carbonic materials obtained by downstream deposition in a low pressure argon plasma beam injected with acetylene are reported. The influence of substrate temperature, presence of Ni catalyst and hydrogen in gas composition on the material properties is described. By increasing the substrate temperature, an enhanced order in the material is revealed by Raman spectroscopy, while FTIR measurements show a decreasing of the hydrogen content and the disappearing of sp1 hybridized carbon in the deposit. The SEM and Raman investigation show a clear tendency of crystalline phases formation when hydrogen is assisting the deposition.
  • Keywords
    PECVD , Amorphous hydrogenated carbon material , Nanostructured carbon , RF plasma beam
  • Journal title
    Applied Surface Science
  • Serial Year
    2009
  • Journal title
    Applied Surface Science
  • Record number

    1011293