Title of article
Effects of thermal annealing temperature and duration on hydrothermally grown ZnO nanorod arrays
Author/Authors
X.Q. Zhao، نويسنده , , C.R. Kim، نويسنده , , J.Y. Lee، نويسنده , , C.M. Shin، نويسنده , , J.H. Heo، نويسنده , , J.Y. Leem، نويسنده , , H. Ryu، نويسنده , , J.H. Chang، نويسنده , , H.C. Lee & E.M. Baggs، نويسنده , , C.S. Son، نويسنده , , B.C. Shin، نويسنده , , W.J. Lee، نويسنده , , W.G. Jung، نويسنده , , S.T. Tan، نويسنده , , J.L. Zhao، نويسنده , , X.W. Sun، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
5
From page
5861
To page
5865
Abstract
In this study, the effects of thermal annealing temperature and duration on ZnO nanorod arrays fabricated by hydrothermal method were investigated. The annealed ZnO/Si(1 1 1) substrate was used for ZnO nanorod array growth. The effects of annealing treatment on the structural and optical properties were investigated by scanning electron microscopy, X-ray diffraction, and room-temperature photoluminescence measurements. With the annealing temperature of 750 °C and the annealing duration of 10 min, both the structural and optical properties of the ZnO nanorod arrays improved significantly, as indicated in the X-ray diffraction and photoluminescence measurement.
Keywords
Annealing treatment , Hydrothermal synthesis , ZnO
Journal title
Applied Surface Science
Serial Year
2009
Journal title
Applied Surface Science
Record number
1011390
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