Title of article :
In situ monitoring of ZnO formation by photoemission spectroscopy
Author/Authors :
Suttinart Noothongkaew، نويسنده , , Ratchadaporn Supruangnet، نويسنده , , Worawat Meevasana، نويسنده , , Hideki Nakajima، نويسنده , , Sukit Limpijumnong، نويسنده , , Prayoon Songsiriritthigul، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
4
From page :
980
To page :
983
Abstract :
Exposure of a clean Zn metal to oxygen in ultra high vacuum provides a mean to gradually form ZnO. With in situ synchrotron photoelectron measurement, the progressive change in the spectra with the oxygen exposure time is observed. The analysis of the spectra allows the determination of ZnO formation. It was found that the oxidation process takes place until reaching the critical thickness, at which the oxidation rate reduces greatly to nearly zero. The critical thickness was determined to be about 2 monolayers.
Keywords :
ZnO , Oxidation of Zn , Synchrotron radiation , Photoemission spectroscopy
Journal title :
Applied Surface Science
Serial Year :
2009
Journal title :
Applied Surface Science
Record number :
1011550
Link To Document :
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