Title of article :
Replication of mold for UV-nanoimprint lithography using AAO membrane
Author/Authors :
Weimin Zhou، نويسنده , , Jing Zhang، نويسنده , , Xiaoli Li، نويسنده , , Yanbo Liu، نويسنده , , Guoquan Min، نويسنده , , Zhitang Song)، نويسنده , , Jianping Zhang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
4
From page :
8019
To page :
8022
Abstract :
A simple and highly effective method to the replication of soft mold based on the anodic aluminum oxide (AAO) membrane was developed. The soft mold with nanopillar arrays was composed of the toluene diluted PDMS layer supported by the soft PDMS. A water contact angle as high as 114° was achieved. The hexagonally well-order arrays of holes of nanometer dimensions, ∼100 nm pore diameter and 125 nm center-to-center pore, could be gained over large areas by UV-nanoimprint lithography (UV-NIL) with the replicated soft PDMS mold. It is expected that the developed soft mold would find applications in light emitting diodes devices.
Keywords :
UV-nanoimprint lithography , Soft lithography , AAO membrane
Journal title :
Applied Surface Science
Serial Year :
2009
Journal title :
Applied Surface Science
Record number :
1012035
Link To Document :
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