Title of article :
Modification of the surface properties of polyimide films using polyhedral oligomeric silsesquioxane deposition and oxygen plasma exposure
Author/Authors :
Christopher J. Wohl، نويسنده , , Marcus A. Belcher، نويسنده , , Sayata Ghose، نويسنده , , John W. Connell، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Abstract :
Topographically rich surfaces were generated by spray-coating organic solutions of a polyhedral oligomeric silsesquioxane, octakis(dimethylsilyloxy)silsesquioxane (POSS), on Kapton® HN films and exposing them to radio frequency generated oxygen plasma. Changes in both surface chemistry and topography were observed. High-resolution scanning electron microscopy indicated substantial modification of the POSS-coated polyimide surface topographies as a result of oxygen plasma exposure. Water contact angles varied from 104° for unexposed POSS-coated surfaces to ∼5° for samples exposed for 5 h. Modulation of the dispersive and polar contributions to the surface energy was determined using van Oss Good Chaudhury theory. Changes in surface energy are related to potential adhesive interactions with lunar dust simulant particles.
Keywords :
Polyimide , Polyhedral oligomeric silsesquioxane , Lunar dust , Oxygen plasma
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science