Fabrication of nitrogen-doped TiO2 layer on titanium substrate

In this paper, macropores TiO2 layer was fabricated on titanium substrates based on plasma based ion implantation (PBII). In order to increase the photodegradation efficiency of fabricated TiO2 layer, two approaches are used: (1) preparation of macropores on TiO2 layer to increase the total photodegradation area and (2) nitrogen doping (N-doping) to increase light absorption efficiency. The fabrication process of the N-doped macropores TiO2 layer comprises four steps: firstly, helium plasma based ion implantation (He-PBII) is employed to generate He bubbles in substrate; secondly, oxygen plasma based ion implantation (O-PBII) and a followed annealing in air are executed to obtain rutile and anatase mixture TiO2 phases; thirdly, He bubbles are exposed to the surface via an Ar ion sputter process; lastly, the samples are doped by nitrogen PBII (N-PBII). The photodegradation of Rhodamine B solution under Xe lamp indicates that the TiO2 layer with surface macropores and N-doping has higher light photocatalysis efficiency.