Title of article :
Ultrasmall Ge islands with low diameter-to-height aspect ratio on Si(1 0 0)-(2 × 1) surfaces
Author/Authors :
K. Bhattacharjee، نويسنده , , Anupam Roy، نويسنده , , Jay Ghatak، نويسنده , , P.V. Satyam، نويسنده , , B.N. Dev، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Abstract :
Scanning tunneling microscopy (STM) and high resolution cross-sectional transmission electron microscopy (XTEM) studies have been used to investigate the formation of Ge nanocrystals grown on Si(1 0 0)-(2 × 1) surfaces by molecular beam epitaxy (MBE). We observe relatively high density of Ge islands where small ‘pyramids’, small ‘domes’ and facetted ‘domes’ of various sizes co-exist in the film. As revealed from XTEM images, a large fraction of islands, especially dome-shaped Ge islands have been found to have an aspect ratio of ∼1 (diameter):1 (height). Observation of truncated-sphere-shaped Ge islands with a narrow neck contact with the wetting layer is reported.
Keywords :
Scanning tunneling microscopy , Ge islands on Si , Transmission electron microscopy
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science