• Title of article

    Predicting secondary ion formation in molecular dynamics simulations of sputtering

  • Author/Authors

    B. Weidtmann، نويسنده , , A. Duvenbeck، نويسنده , , A. Wucher، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    3
  • From page
    813
  • To page
    815
  • Abstract
    We present a model to incorporate the excitation and ionization of sputtered particles into molecular dynamics simulations of ion bombardment-induced collision cascades in metals. The kinetic excitation of the solid is described by electronic friction experienced by all moving particles and electron promotion in close atomic collisions. Transport of the resulting excitation energy is treated by a nonlinear diffusion equation. The resulting space- and time-dependent electron temperature is then introduced into a rate equation model describing the ionization of ejected particles. This way, secondary ion formation is described by assigning an individual ionization probability to every sputtered atom. Averaging over the entire flux, this allows the prediction of measurable quantities like integral or spectral ionization probabilities as well as velocity spectra of secondary ions.
  • Journal title
    Applied Surface Science
  • Serial Year
    2008
  • Journal title
    Applied Surface Science
  • Record number

    1012528