Title of article :
Size dependent 2p3/2 binding-energy shift of Ni nanoclusters on SiO2 support: Skin-depth local strain and quantum trapping
Author/Authors :
Yanguang Nie، نويسنده , , Jisheng Pan، نويسنده , , Zheng Zhang، نويسنده , , Jianwei Chai، نويسنده , , Lai Huang and Shijie Wang، نويسنده , , Chiam Sing Yang، نويسنده , , Daniel Li، نويسنده , , Chang Q. Sun، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
5
From page :
4667
To page :
4671
Abstract :
An in situ X-ray photoelectron emission investigation revealed that the size trend of the 2p3/2 binding-energy shift (BES) of Ni nanoclusters grown on SiO2 substrate follows the prediction of the bond order–length–strength (BOLS) correlation theory . Theoretical reproduction of the measurements turns out that the 2p3/2 binding energy of an isolated Ni atom is 850.51 eV and its intrinsic bulk shift is 2.70 eV. Findings confirmed that the skin-depth local strain and potential well quantum trapping induced by the shorter and stronger bonds between under-coordinated surface atoms provide perturbation to the Hamiltonian and hence dominate the size dependent BES.
Keywords :
Surface core level shift , Ni , Nanostructures
Journal title :
Applied Surface Science
Serial Year :
2010
Journal title :
Applied Surface Science
Record number :
1012745
Link To Document :
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