Title of article :
Roughness evolution of Si surfaces upon Ar ion erosion
Author/Authors :
V.I.T.A. de Rooij-Lohmann، نويسنده , , I.V. Kozhevnikov، نويسنده , , L. Peverini، نويسنده , , Toni E. Ziegler، نويسنده , , R. Cuerno، نويسنده , , F. Bijkerk، نويسنده , , A.E. Yakshin، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Abstract :
We studied the roughness evolution of Si surfaces upon Ar ion erosion in real time. Following the theory of surface kinetic roughening, a model proposed by Majaniemi was used to obtain the value of the dynamic scaling exponent β from our data. The model was found to explain both the observed roughening and the smoothening of the surfaces. The values of the scaling exponents α and β, important for establishing a universal model for ion erosion of (Si) surfaces, have been determined. The value of β proved to increase with decreasing ion energy, while the static scaling exponent α was found to be ion energy independent.
Keywords :
X-ray scattering , Ion erosion , Si , Dynamic scaling
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science