Author/Authors :
S. Flickyngerova، نويسنده , , J. Skriniarova، نويسنده , , M. Netrvalova، نويسنده , , J. Kovac Jr.، نويسنده , , I. Novotny، نويسنده , , P. Sutta، نويسنده , , V. Tvarozek، نويسنده ,
Abstract :
Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting “smooth” surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.
