Title of article :
Oblique angle deposition of TiO2 thin films prepared by electron-beam evaporation Review Article
Author/Authors :
Min Wook Pyun، نويسنده , , Eui Jung Kim، نويسنده , , Dae-Hwang Yoo، نويسنده , , Sung Hong Hahn، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
5
From page :
1149
To page :
1153
Abstract :
Optical, structural and photocatalytic properties of TiO2 thin films obliquely deposited on quartz glass substrate using an electron-beam evaporation method were investigated. The photocatalytic activity of the films was evaluated by photodecomposition of methylene blue. An increase in incident deposition angle increased the porosity and surface roughness of the TiO2 films. As a result, the photocatalytic activity was enhanced with incident deposition angle up to 60°. However, a further increase in incident deposition angle to 75° reduced the photocatalytic activity due to a lack of the crystalline phase.
Keywords :
E-beam evaporation , Oblique angle deposition , Photocatalytic activity , TiO2 thin film
Journal title :
Applied Surface Science
Serial Year :
2010
Journal title :
Applied Surface Science
Record number :
1013453
Link To Document :
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