Title of article
The effect of SiO2 buffer layer on the electrical and structural properties of Al-doped ZnO films deposited on soda lime glasses
Author/Authors
K.H. Ri، نويسنده , , Y.B. Wang، نويسنده , , W.L. Zhou، نويسنده , , J.X. Gao، نويسنده , , X.J. Wang، نويسنده , , J. Yu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
5
From page
5471
To page
5475
Abstract
In this paper, the influence of SiO2 buffer layer on electrical and structural properties of AZO films on soda lime glasses has been investigated. The results showed that the Hall mobility and carrier concentration of AZO films deposited on soda lime glasses at high temperature could be enhanced by introducing SiO2 layers. The optical absorption edges of AZO films with SiO2 buffer layer are blue shifted compared with that of buffer layer free due to the increase of carrier concentration. SiO2 layers prepared at 400 °C more effectively suppress the diffusion of Na atoms into AZO films compared with that prepared at room temperature. On the other hand, the in-plane stress dependence of optical band gap is linear for AZO films deposited on quartz glass substrates, but is deviated from linearity in the case of soda lime glass substrates.
Keywords
Al doped zinc oxide , Transparent conducting film , Sputtering , Soda lime glass , Buffer layer
Journal title
Applied Surface Science
Serial Year
2011
Journal title
Applied Surface Science
Record number
1014194
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