Title of article :
The transparence comparison of Ga- and Al-doped ZnO thin films
Author/Authors :
Zheng-Zheng Li، نويسنده , , Zhi-Zhan Chen، نويسنده , , Wei Huang، نويسنده , , Shao-Hui Chang، نويسنده , , Xue-Ming Ma، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
4
From page :
8486
To page :
8489
Abstract :
The Ga-doped ZnO (GZO) and Al-doped ZnO (AZO) thin films were grown on quartz glass substrates by pulsed laser deposition under different oxygen partial pressures image The transparent performances of films versus properties of structure and conductivity were discussed. With the increase of image the transmittance of both GZO films and AZO films increased to maximum and then decreased which were in according with the change of crystallization quality. The transmittance of GZO films was higher than that of AZO films, which were not dominated by the impurity ions induced by doping. AFM images and surface roughness mean square coefficients showed that the surfaces of GZO films were smoother than that of AZO films, which were due to the dopant Ga acting as the surfactant and smoothed the GZO films surface.
Keywords :
ZnO thin films , TCO electrode , Ga- and Al-doped ZnO
Journal title :
Applied Surface Science
Serial Year :
2011
Journal title :
Applied Surface Science
Record number :
1014745
Link To Document :
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