• Title of article

    Effect of Gas Holdup on Current Density Distribution in Horizontal Electrolysis Cell

  • Author/Authors

    Tsuge، Hideki نويسنده , , Tozawa، Kazuhiro نويسنده , , Muguruma، Yukinori نويسنده , , Kawabe، Masaki نويسنده , , Abe، Masaki نويسنده , , Sagiyama، Masaru نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    -706
  • From page
    707
  • To page
    0
  • Abstract
    In the electroplating industry, it is essential to know and control the current density distribution in the electroplating cell. To make clear the behaviour of gas bubbles produced in the horizontal electroplating cell, the effects of the electrolyte velocity and average current density on the current density distribution in the cell were investigated. The increase in overall resistance and the resulting non-uniformity in current density distribution in the horizontal electrolysis cell were theoretically discussed by modifying Tobias concept derived for the vertical electrolysis cell.
  • Journal title
    The Canadian Journal of Chemical Engineering
  • Serial Year
    2003
  • Journal title
    The Canadian Journal of Chemical Engineering
  • Record number

    102672