Title of article
Effect of Gas Holdup on Current Density Distribution in Horizontal Electrolysis Cell
Author/Authors
Tsuge، Hideki نويسنده , , Tozawa، Kazuhiro نويسنده , , Muguruma، Yukinori نويسنده , , Kawabe، Masaki نويسنده , , Abe، Masaki نويسنده , , Sagiyama، Masaru نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
-706
From page
707
To page
0
Abstract
In the electroplating industry, it is essential to know and control the current density distribution in the electroplating cell. To make clear the behaviour of gas bubbles produced in the horizontal electroplating cell, the effects of the electrolyte velocity and average current density on the current density distribution in the cell were investigated. The increase in overall resistance and the resulting non-uniformity in current density distribution in the horizontal electrolysis cell were theoretically discussed by modifying Tobias concept derived for the vertical electrolysis cell.
Journal title
The Canadian Journal of Chemical Engineering
Serial Year
2003
Journal title
The Canadian Journal of Chemical Engineering
Record number
102672
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