Multi-element characterization of high purity cadmium using inductively coupled plasma quadrupole mass spectrometry and glow-discharge quadrupole mass spectrometry Original Research Article

Trace element impurities in high purity cadmium were determined after absorption of trace impurities on Dowex-50WX8 from 0.2 M HNO3 + 0.25 M HCl medium. Residual cadmium was removed by washing the column with 0.5 M HCl. The absorbed elements were eluted with 6 M HNO3. Inductively coupled plasma quadrupole mass spectrometry (ICP-QMS) was used for the determination of impurities. This study showed that the removal of the cadmium matrix was nearly quantitative (>99.99%). The recoveries of trace elements were found to be >98%. Characterization of the same high purity cadmium sample was also carried out using glow-discharge quadrupole mass spectrometry (GD-QMS). The Cd sample, in the form of a pin, was used. Relative sensitivity factors (RSF) values given by the instrument manufacturer were used to compute the concentrations. Interferences encountered in the determination are discussed. Good agreement was observed for many elements. Both ICP-QMS and GD-QMS have been found to be suitable for the trace element characterization of a high purity (5N+) cadmium sample. More elements could be reported using GD-QMS.