Title of article
Influence of substrate orientation on In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy
Author/Authors
Weihong Jiang، نويسنده , , Huaizhe Xu )، نويسنده , , Bo Xu، نويسنده , , Xiaoling Ye، نويسنده , , Wei Zhou، نويسنده , , Ding Ding، نويسنده , , Jiben Liang، نويسنده , , Zhanguo Wang، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2000
Pages
7
From page
134
To page
140
Abstract
In this paper, In0.5Ga0.5As quantum dots are fabricated on GaAs (1 0 0) and (n 1 1)A/B (n=3,5) substrates by molecular beam epitaxy. Atomic force microscopy shows that the quantum dots on each oriented substrate are different in size, shape and distribution. In addition, photoluminescence spectra from these quantum dots are different in emission peak position, line width and integrated intensity. Auger electron spectra demonstrate that In concentration is larger near the surface than inside quantum dots, suggesting the occurrence of surface segregation effect during the growth of InGaAs dots. The surface segregation effect is found to be related to substrate orientation.
Keywords
Quantum dots , High index , Molecular beam epitaxy , Photoluminescence
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2000
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1044580
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