Novel nonlithographic quantum wire array fabrication

We have developed a novel nonlithographic technique for the fabrication of large arrays of quantum wires with complex layered structures that will find applications in many fields. The technique is based on an image reversal process to form an array of tantalum oxide nano-pillars that are used as masks for the etching of epitaxially grown semiconductor layers on an arbitrary substrate. This technique can be used to form quantum wires of complex layered structures that are essential for most practical applications. We have developed the technology to create quantum wires of silicon, however, the technique can be extended to any other material system.