Title of article :
Unipolar rectifying silicon nanowires—TCAD study
Author/Authors :
K. Fobelets، نويسنده , , J.E. Velazquez-Perez، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2008
Pages :
4
From page :
2481
To page :
2484
Abstract :
Due to the large surface to volume ratio in nanowires, small changes in surface condition result in large changes in current–voltage characteristics. As a consequence, the overlap of the end-wire contact with the oxide-covered surface along the length of the nanowire can have a significant effect on the current–voltage characteristics of the wire. We present TCAD studies of this effect. One of the contacts at the end of the wire envelops a part of the surface along the length of the oxide-covered nanowire, resulting in a partial gating of the wire by the voltage applied to the Ohmic contact. This gating causes rectifying behaviour in the unipolar nanowire, creating a conducting surface channel in forward bias and space-charge-limited current in reverse bias. TCAD studies show that the length of contact overlap relative to the length of the nanowire influences the off-current to a large extent, dramatically decreasing the off-current with increasing overlap. TCAD results of the influence of wire diameter, length, and workfunction on the rectifying behaviour of the unipolar nanowire are also presented.
Keywords :
Nanowires , TCAD , Rectification
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Serial Year :
2008
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Record number :
1047391
Link To Document :
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