Title of article :
Atomic-scale characterization of silicon diffusion on carbon nanotubes
Author/Authors :
Hongyu Zhang، نويسنده , , Xuejuan Zhang، نويسنده , , Mingwen Zhao، نويسنده , , Zhenhai Wang، نويسنده ,
Issue Information :
ماهنامه با شماره پیاپی سال 2010
Pages :
4
From page :
610
To page :
613
Abstract :
Adsorption and diffusion of silicon on the exterior surface of carbon nanotubes are crucial for the growth of silicon carbide nanotubes (SiCNTs) from carbon nanotubes. We have carried out first-principles calculations to explore these processes. We found that a silicon atom prefers to be adsorbed at the bridge site above a C−C bond tilted to the tube axis with binding energy of 1.29−1.61 eV. The adsorbed silicon atoms have high mobility with diffusion energy barriers less than 0.06 eV. The energetically favorable diffusion paths are oriented along the tube axis.
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Serial Year :
2010
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Record number :
1048594
Link To Document :
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