Title of article :
Scattering by flexural phonons in suspended graphene under back gate induced strain
Author/Authors :
H. Ochoa، نويسنده , , Eduardo V. Castro، نويسنده , , M.I. Katsnelson، نويسنده , , F. Guinea، نويسنده ,
Issue Information :
ماهنامه با شماره پیاپی سال 2012
Pages :
4
From page :
963
To page :
966
Abstract :
We have studied electron scattering by out-of-plane (flexural) phonon modes in doped suspended graphene and its effect on charge transport. In the free-standing case (absence of strain) the flexural branch shows a quadratic dispersion relation, which becomes linear at long-wavelengths when the sample is under tension due to the rotational symmetry breaking. In the non-strained case, scattering by flexural phonons is the main limitation to electron mobility. This picture changes drastically when strains above View the MathML source are considered. Here we study in particular the case of back gate induced strain, and apply our theoretical findings to recent experiments in suspended graphene.
Keywords :
Graphene , Phonons , Strain , Resistivity
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Serial Year :
2012
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Record number :
1048985
Link To Document :
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