Title of article
Low-operating-voltage 1.5-image-electroluminescent device with an Er-doped silicon suboxide layer and electron injection from tin oxide
Author/Authors
Yoshihiro Naka، نويسنده , , Shinya Soneda، نويسنده , , Seiichi Nakano، نويسنده , , Takeshi Sumiyoshi، نويسنده , , Masahiro Tsuchiya، نويسنده , , Yusui Nakamura، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2013
Pages
4
From page
187
To page
190
Abstract
A new scheme for a silicon-oxide-based electroluminescent device is proposed and demonstrated. This scheme employs a thin Er-doped silicon suboxide active layer. Its low oxygen content and a tin-oxide electron injection layer have led to the realization of low voltage operation since they could reduce the potential barrier for tunneling electron injection. The threshold voltage for photoemission was reduced to 9 V, which is much lower than previously reported threshold voltages.
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2013
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1049223
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