Author/Authors :
K. Tonisch، نويسنده , , S. F. Weise، نويسنده , , M. Stubenrauch، نويسنده , , V. Cimalla، نويسنده , , G. Ecke، نويسنده , , F. Will، نويسنده , , H. Romanus، نويسنده , , S. Mrotzek، نويسنده , , H. Hofmeister، نويسنده , , M. Hoffmann، نويسنده , , D. Hülsenberg، نويسنده , , O. Ambacher، نويسنده ,
Abstract :
We report on the growth of silicon nanowires on photostructurable glass by low-pressure chemical vapour deposition. Thereby, no additional catalyst was needed to stimulate the growth process. Instead, a self-organized crystallization process leads to the formation of metallic clusters and seed crystals within the glass, which are supposed to initialize the nanowire growth. The nanowires were contacted by direct deposition of Pt using a focussed ion beam system and characterized electrically.