Title of article
Reactions of ground state Ti atoms with NO: insertion versus complexation. An IR matrix isolation study Original Research Article
Author/Authors
Lahouari Krim، نويسنده , , Christophe Prot، نويسنده , , Esma??l M. Alikhani، نويسنده , , Laurent Manceron، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2000
Pages
8
From page
267
To page
274
Abstract
The reaction of ground state Ti atoms with NO during condensation in solid argon has been reinvestigated. The NTiO molecule, already characterized in reactions of laser-ablated Ti, is the only product observed for the reaction between one Ti atom and one nitric oxide molecule. Isotopic data on ν1, ν2, ν3, 2ν1 and 2ν2 have been measured in the mid- and far-infrared regions. This enables a complete harmonic force-field calculation based on a bent geometry, in agreement with the conclusions of the previous study. No evidence is found, however, of a metastable nitrosyl complex intermediate, as previously proposed. This study confirms that the insertion reaction proceeds directly from the ground electronic state reagents, with no or very little activation energy.
Journal title
Chemical Physics
Serial Year
2000
Journal title
Chemical Physics
Record number
1055921
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