Title of article :
Anode growth of DSSCs by flat-flame chemical vapor deposition method
Author/Authors :
Y.J. Chen، نويسنده , , Y.S. Lo، نويسنده , , C.H. Huang، نويسنده , , Y.C. Cai، نويسنده , , M.C. Hsu، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2010
Pages :
6
From page :
181
To page :
186
Abstract :
A unique method of flat-flame chemical vapor deposition, to synthesize nanostructured TiO2 film used for dye-sensitized solar cells (DSSCs) is reported for the first time. This method produces nanostructures of TiO2 exactly ideal for the anode of the DSSCs. Results show that cells have characteristic I–V curves with fill factor typically around 70% and efficiency higher than 4%. A dendrite-like microstructure of anodes accounts for the high efficiency of the cell. The successful formation of dendrite-like microstructure provides a chance for sintering of TiO2 nanoparticles smaller than 20 nm, a possible cell efficiency enhancement by increased dye absorption due to the increased specific surface area of small particles.
Keywords :
Chemical vapor deposition (CVD) , Flame , Electrochemical properties , DSSC , TiO2 , Nanostructures
Journal title :
Materials Chemistry and Physics
Serial Year :
2010
Journal title :
Materials Chemistry and Physics
Record number :
1058821
Link To Document :
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