Title of article :
Synthesis and properties of novel photosensitive poly(arylene ether sulfone) containing chalcone moiety in the main chain
Author/Authors :
Pushan Wen، نويسنده , , Lei Wang، نويسنده , , Aiqing Zhang، نويسنده , , Xiang-Dan Li، نويسنده , , Myong-Hoon Lee، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2011
Abstract :
A new series of photosensitive poly(arylene ether sulfone)s containing chalcone moiety in the main chain were synthesized from 4,4′-dihydroxychalcone (4DHC), 4,4′-difluorodiphenylsulfone (DFDPS) and bisphenol A (BPA). This series of polymers were characterized by 1H NMR, FT-IR, UV spectroscopy, thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC). The polymers were stable up to 400 °C, which indicates that the polymers possess good thermal properties. The polymers were found to be soluble in polar solvents and chlorinated solvents. However, the polymers were insoluble in hydrocarbons and in hydroxyl group-containing solvents. After the irradiation of UV light, the thin polymer film was crosslinked to give an insoluble film in the absence of a photoinitiator or sensitizers. The rate of photocrosslinking was also examined and discussed.
Keywords :
Photosensitive , UV-crosslinking , Thermal properties , Polymer , Chemical synthesis
Journal title :
Materials Chemistry and Physics
Journal title :
Materials Chemistry and Physics