Title of article
Low-temperature growth of ZnO nanostructures by oxygen plasma oxidation of ZnCl2
Author/Authors
Rong Yang، نويسنده , , Zhi-Jie Zheng، نويسنده , , Wei Li، نويسنده , , Jianglan Qu، نويسنده , , Xuanzhou Zhang، نويسنده , , Xingguo Li، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2011
Pages
3
From page
693
To page
695
Abstract
The thermodynamically forbidden reaction between ZnCl2 and O2 was able to take place by using oxygen plasma, yielding cone-shaped ZnO nanostructure. In situ optical emission spectroscopy was used to identify the excited species during the plasma enhanced reaction. The determination of excited temperature suggested that the addition of O2 had great contribution to the enhanced dissociation of ZnCl2. The successful synthesis of ZnO indicates that the chlorides may replace the organometallics as a new precursor in thin film preparation industry.
Keywords
ZnO , Thin film , Nanostructure , Plasma , Chemical vapor deposition
Journal title
Materials Chemistry and Physics
Serial Year
2011
Journal title
Materials Chemistry and Physics
Record number
1059363
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