• Title of article

    Low-temperature growth of ZnO nanostructures by oxygen plasma oxidation of ZnCl2

  • Author/Authors

    Rong Yang، نويسنده , , Zhi-Jie Zheng، نويسنده , , Wei Li، نويسنده , , Jianglan Qu، نويسنده , , Xuanzhou Zhang، نويسنده , , Xingguo Li، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2011
  • Pages
    3
  • From page
    693
  • To page
    695
  • Abstract
    The thermodynamically forbidden reaction between ZnCl2 and O2 was able to take place by using oxygen plasma, yielding cone-shaped ZnO nanostructure. In situ optical emission spectroscopy was used to identify the excited species during the plasma enhanced reaction. The determination of excited temperature suggested that the addition of O2 had great contribution to the enhanced dissociation of ZnCl2. The successful synthesis of ZnO indicates that the chlorides may replace the organometallics as a new precursor in thin film preparation industry.
  • Keywords
    ZnO , Thin film , Nanostructure , Plasma , Chemical vapor deposition
  • Journal title
    Materials Chemistry and Physics
  • Serial Year
    2011
  • Journal title
    Materials Chemistry and Physics
  • Record number

    1059363