Title of article :
Modeling of aerosol deposition of titania thin films
Author/Authors :
Fausto Di Muzio، نويسنده , , Maurizio Masi، نويسنده , , Sergio Carrà، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2000
Pages :
8
From page :
286
To page :
293
Abstract :
The size-controlled TiO2 particles are usually employed in semiconductor devices, catalysis and photo-catalysis, adsorption and optical technology. In this work, the kinetics of the aerosol process involving the precursor tetraisopropyl orthotitanate (TPT) and water as reactants kept in supercritical conditions (using CO2 as solvent) and a detailed description of the fluid dynamic variables coupled with the statistical distribution of the particles inside the reactor are investigated. A turbulent diffusive flow is forced into the reactor to guarantee a complete conversion of the reactants and the production of small diameter particles. Furthermore, the particle formation can be well represented by means of the general dynamic equation (GDE). To allow a coupling between the solution of the fluid dynamic fields and the representation of the particle evolution within the reactor, the method of moments was applied to GDE to determine the most important statistical variables of a particle.
Keywords :
Titania , Aerosol , Modeling , Particle size distribution , Powders , Thin films
Journal title :
Materials Chemistry and Physics
Serial Year :
2000
Journal title :
Materials Chemistry and Physics
Record number :
1060383
Link To Document :
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