Title of article :
Interfacial SiC formation in polysiloxane-derived Si–O–C ceramics
Author/Authors :
Q. Wei، نويسنده , , E. Pippel، نويسنده , , J. Woltersdorf، نويسنده , , M. Scheffler، نويسنده , , P. Greil، نويسنده ,
Issue Information :
ماهنامه با شماره پیاپی سال 2002
Pages :
9
From page :
281
To page :
289
Abstract :
Poly(methylsilsesquioxane) (CH3SiO1.5)n (PMS) loaded with 40 vol.% Si-filler powder was pyrolyzed in inert atmosphere up to 1400 °C to fabricate Si–O–C composite ceramics. The evolution of the interface microstructure between the filler and the matrix was studied by high resolution electron microscopy (HREM), energy-dispersive X-ray spectroscopy and electron energy loss spectroscopy. While below pyrolysis temperatures of 1000 °C no filler reaction was observed (inert filler regime), a porous interface layer of nanosized ß-SiC was formed at reaction temperatures above 1200 °C. Due to a high fraction of open porosity of 13% (1000 °C) to 19% (1400 °C) in the polymer-derived Si–O–C matrix, gas-phase transport and reaction processes involving CO and SiO as the dominant species are likely to occur at the interface boundary layer.
Keywords :
EELS , ELNES , Polymer-/filler-derived ceramics , Interface reaction , HVEM , HREM , EDXS
Journal title :
Materials Chemistry and Physics
Serial Year :
2002
Journal title :
Materials Chemistry and Physics
Record number :
1060755
Link To Document :
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