Title of article
The response of a NiOx thin film to a step potential and its electrochromic mechanism
Author/Authors
S.R. Jiang*، نويسنده , , P.X. Yan، نويسنده , , B.X. Feng، نويسنده , , X.M. Cai، نويسنده , , J Wang، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2003
Pages
6
From page
384
To page
389
Abstract
The response of an RF sputtered NiOx thin film to step potential and its electrochromic mechanism have been investigated. It was found that the NiOx films manifested fine electrochromic properties. Bleaching and coloration did not cause the change of the film’s structure. The NiOx films are non-stoichoimetric with Ni vacancies. It is suggested that the bleaching and coloration reaction of the NiOx films in a KOH solution occurs along the grain boundaries. The physical absorption of colored NiOx films is caused by the intraband absorbance of the t2g level of the Ni3+ ion.
Keywords
NiOx film , Electrochromic properties , Electrochemical mechanism
Journal title
Materials Chemistry and Physics
Serial Year
2003
Journal title
Materials Chemistry and Physics
Record number
1060982
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