Title of article :
Nanostructuring in Ni/SiC reaction layers, investigated by imaging of atomic columns and DFT calculations
Author/Authors :
A. H?hnel، نويسنده , , E. Pippel، نويسنده , , V. Ischenko، نويسنده , , J. Woltersdorf، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2009
Pages :
7
From page :
802
To page :
808
Abstract :
Formation and structuring of the product phases of solid state reactions between nickel and silicon carbide were evidenced by high resolution electron microscopy (HREM), as well as by high angle annular dark field scanning transmission technique (HAADF-STEM) allowing the element-sensitive Z-contrast. The observed preferential orientation relationships between precipitated graphite and δ-Ni2Si as well as between the silicide and the 6H-silicon carbide substrate could be explained by epitaxial relations between the corresponding phases. The diffusion-related mechanisms of the carbon precipitation were investigated in the framework of density functional theory (DFT), yielding information on the diffusion barriers and preferential diffusion directions of carbon atoms in δ-Ni2Si. The calculated driving forces for solution and precipitation of carbon within the silicide phase are discussed.
Keywords :
Thin films , Textured growth , Graphitic carbon , Silicon carbide , High resolution and analytical electron microscopy (HAADF-STEM , Z-contrast) , Density functional theory , Nickel silicide , Diffusion
Journal title :
Materials Chemistry and Physics
Serial Year :
2009
Journal title :
Materials Chemistry and Physics
Record number :
1061563
Link To Document :
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