Title of article :
Silica-supported silicotungstic acid: A study by X-ray photoelectron spectroscopy
Author/Authors :
Frank J. Berry، نويسنده , , Glyn R. Derrick، نويسنده , , José F. Marco، نويسنده , , Michael Mortimer، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2009
Pages :
4
From page :
1000
To page :
1003
Abstract :
W 4f and O 1s X-ray photoelectron spectra for silicotungstic acid, H4SiW12O40, in pure and silica-supported form are reported. W 4f XP spectra for the supported acid are analysed in terms of contributions from two W(VI) spin–orbit doublets arising from tungsten atoms in terminal Wdouble bond; length as m-dashO bonds some of which directly interact with the silica surface. At low loading (3.2 wt.%) significant changes in the relative contributions and binding energies of the two spin–orbit doublets are taken as evidence of a strong interaction of individual [SiW12O40]4− anions with highly active sites on the silica surface. It is suggested that selective ordering of silanol groups can occur on the silica surface in order to accommodate the adsorption of individual [SiW12O40]4− anions.
Keywords :
X-ray photoemission spectroscopy (XPS) , Surfaces , Chemisorption
Journal title :
Materials Chemistry and Physics
Serial Year :
2009
Journal title :
Materials Chemistry and Physics
Record number :
1061611
Link To Document :
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