Title of article :
Growth and characterization of WS2 thin films deposited by dip method
Author/Authors :
P.P. Hankare، نويسنده , , P.A. Chate، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2009
Abstract :
Tungsten disulphide has been grown by dip technique on glass substrate using sodium tungstate and thiourea as sources of tungsten and sulphide ion respectively. X-ray diffraction of as deposited thin film indicated polycrystalline character with rhombohedral phase. Optical study shows a direct band gap nature with band gap energy 1.4 eV. Conductivity measurement showed a semiconductor-type temperature dependence characterized by activation energy 0.659 eV.
Keywords :
Thin films , Crystal growth , Semiconductor , Chemical synthesis , Electrical properties
Journal title :
Materials Chemistry and Physics
Journal title :
Materials Chemistry and Physics