Title of article
Growth of carbon nanotubes using microwave plasma-enhanced chemical vapor deposition process
Author/Authors
Ruo-Mei Liu، نويسنده , , Jyh-Ming Ting، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2003
Pages
4
From page
571
To page
574
Abstract
Carbon nanotubes were grown on Si substrates using a plasma enhanced chemical vapor deposition technique under various gaseous compositions, microwave powers, and pressures. An iron-containing compound was used as the catalyst. The hydrocarbon used was methane. The resulting carbon nanotubes were examined using scanning electron microscopy and transmission electron microscopy. The diameters of carbon nanotubes (CNTs) were found to be dominated by methane concentration and plasma power. It was also found that the catalyst particles were deformed during the growth of CNTs which led to a sheath growth mechanism.
Keywords
Carbon nanotubes , CVD , Catalyst , Microwave
Journal title
Materials Chemistry and Physics
Serial Year
2003
Journal title
Materials Chemistry and Physics
Record number
1061968
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