Fabrication and properties of vitreous silica films prepared by flame hydrolysis deposition

SiO2 thick films were quickly deposited on silicon wafers by flame hydrolysis deposition (FHD) method, followed by consolidation in electric resistance furnace at 1380 °C. The as-deposited films were confirmed to be vitreous silica by means of SEM and X-ray diffraction (XRD). The thickness of the films is up to 37 μm, and the deposition speed is as high as 8 μm min−1. The refractive index and absorbing loss (extinction coefficient) are also measured by spectroscopic ellipsometer.