Chemical roles of peroxide-based alkaline slurries in chemical–mechanical polishing of Ta: investigation of surface reactions using time-resolved impedance spectroscopy

This work presents an electrochemical investigation of chemical reactions kinetics in chemical–mechanical polishing of Ta in a peroxide-based alkaline medium. Time resolved Fourier transform electrochemical impedance spectroscopy is combined with cyclic voltammetry to probe the chemical roles of H2O2 and OH− in chemical–mechanical polishing. Competitive effects of electro-oxidation and oxide dissolution at a Ta disc electrode are studied in four different (nearly neutral, alkaline, peroxide-free and peroxide-containing) electrolytes. In alkaline peroxide solutions with pH≥10, surface catalyzed breakdown of interfacial H2O2 promotes certain reactions of oxide-removal from the Ta surface. These reactions are analyzed in detail. The results demonstrate how the detailed chemical aspects of the process, and kinetics of surface reactions in particular, can be probed in real time by using the method mentioned above.