Studies on the effect of substrate temperature on (VI–VI) textured tungsten oxide (WO3) thin films on glass, SnO2:F substrates by PVD:EBE technique for electrochromic devices

Electrochromic VI–VI compound semiconductor tungsten oxide (WO3) thin films have pronounced feature in electrochromic devices. These films have been prepared by employing one of the physical vapour deposition methods (PVD), i.e., electron beam evaporation technique (EBE) at different substrate temperatures. The effects of substrate temperature on structural, surface morphological and optical properties of the films are studied.