The effect of O2 partial pressure on the structure and photocatalytic property of TiO2 films prepared by sputtering

The TiO2 films were prepared on slide substrates by dc reactive magnetron sputtering at different oxygen partial pressure, and were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and Fourier transform infrared spectrometry (FT-IR). The degradation of methyl orange aqueous solutions was used to evaluate the photocatalytic activity. The results show that all films show crystalline anatase structure irrespective of oxygen partial pressure. The surface oxygen element exists in three forms, the first one is TiO2, the second one is OH− and the last one is physical absorbed water. The films deposited at oxygen partial pressure of 0.035 and 0.040 mTorr present better photocatalytic activity, which shows clear tendency to increase with oxygen partial pressure. Such photocatalytic activity results are considered to correlate with the crystalline structure, grain sizes and the OH− concentration.