• Title of article

    Thermoreactive deposition/diffusion coating of chromium carbide by contact-free method

  • Author/Authors

    Chen-Yi Wei، نويسنده , , Fan-Shiong Chen، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2005
  • Pages
    8
  • From page
    192
  • To page
    199
  • Abstract
    A modified TRD (thermoreactive deposition and diffusion) has been investigated in a low-pressure fluidized bed furnace in this study. The specimens were positioned above the surface of the alloying powder. The activator was periodically introduced into the alloying powder to provide the working atmosphere for the required process. Since the pressure of the retort was maintained between 6.7 × 102 and 5.3 × 104 Pa, the consumption of fluidized gas (argon) was reduced significantly. A modified TRD also significantly increased the working space of the treating zone. The results showed that an 8 μm thick chromium carbide layer could be obtained by treating the tool steel AISI D2 at 1030 °C for 4 h. Furthermore, the kinetics of reaction K = K0 exp(−Q/RT) was empirically determined in this study. It is shown that the activator, NH4Cl, can effectively lower the activation energy Q, as well as enhance the formation rate of the carbide layer.
  • Keywords
    Chromium carbide , Vacuum fluidized bed technique , Thermoreactive deposition/diffusion
  • Journal title
    Materials Chemistry and Physics
  • Serial Year
    2005
  • Journal title
    Materials Chemistry and Physics
  • Record number

    1063284