Title of article :
Photo-polymerization of photocurable resins containing polyhedral oligomeric silsesquioxane methacrylate
Author/Authors :
Ho-May Lin، نويسنده , , Shi-Yin Wu، نويسنده , , Feng-Chih Chang، نويسنده , , Ying-Chieh Yen، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2011
Abstract :
Photocurable resins, bisphenol A propoxylate glycerolate diacrylate (BPA-PGDA, containing two hydroxyl) and bisphenol A propoxylate diacrylate (BPA-PDA), with fixed photoinitiator (Irgacure 907) concentration and various contents of methacrylisobutyl polyhedral oligomeric silsesquioxane (MI-POSS) were prepared and characterized by FTIR spectroscopy, scanning electron microscope and differential photocalorimetry. The MI-POSS molecules form crystals or aggregated particles in the cured resin matrix. The BPA-PGDA series photocurable resins show higher viscosity and lower photo-polymerization reactivity than the BPA-PDA series resins. The photo-polymerization rate and conversion of BPA-PGDA series are improved with increasing MI-POSS content. On the contrary, the photo-polymerization behavior of BPA-PDA series photocurable resins remains nearly unchanged by the addition of MI-POSS. Hydrogen-bonding interaction between the hydroxyl of BPA-PGDA and the siloxane of MI-POSS tends to attract and concentrate these acrylate double bonds around MI-POSS particles and thus enhances the photo-polymerization rate and conversion.
Keywords :
Hydrogen bonding , Photocurable resins , Polyhedral oligomeric silsesquioxanes (POSSs) , Acrylate monomer
Journal title :
Materials Chemistry and Physics
Journal title :
Materials Chemistry and Physics